Three-dimensional measurements of plasma parameters in an inductively coupled plasma processing chamber
نویسندگان
چکیده
منابع مشابه
Electron energy distribution function measurements and plasma parameters in inductively coupled argon plasma
Electron energy distribution functions (EEDFs) have been measured in a cylindrical inductively coupled plasma (ICP) with a planar coil over a wide range of external parameters (argon pressure, discharge power and driving frequency). The measurements were performed under well-defined discharge conditions (discharge geometry, rf power absorbed by plasma, external electrical characteristics and el...
متن کاملRegimes of particle trapping in inductively coupled plasma processing reactors
Contamination of wafers by particles in plasma processing reactors is a continuing problem affecting yields of microelectronic devices. In this letter, we report on a computational study of particle contamination of wafers in a high plasma density inductively coupled plasma ~ICP! reactor. When operating with an unbiased substrate, particles readily contaminate the wafer due to high ion fluxes w...
متن کاملModel for noncollisional heating in inductively coupled plasma processing sources
Low pressure ~,10 mTorr! inductively coupled plasma sources are being developed for etching and deposition of semiconductors and metals. In models for these devices, plasma dynamics are typically coupled to the electromagnetic fields through Ohm’s law, which implies that collisional heating is the dominant power transfer mechanism. In this article, we describe an algorithm to couple plasma dyna...
متن کاملEffect of capacitive coupling on inductively coupled fluorocarbon plasma processing
This article describes results obtained using various plasma and surface diagnostics in a study of inductively coupled fluorocarbon plasmas in which the amount of capacitive coupling was systematically varied. It is found that the plasma density decreases while the electron temperature increases as the amount of capacitive coupling is increased at a constant source power level. The rate at whic...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Physics of Plasmas
سال: 2019
ISSN: 1070-664X,1089-7674
DOI: 10.1063/1.5115415